| Source DB | nl |
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| Institution | UGent |
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| Code | 83259596-f648-423a-8f68-58ca40a170dc |
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| Unit | 3b9b4691-0fd0-4fbc-aa3d-3f88e560336b
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| Begin | 10/1/2019 |
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| End | 9/30/2022 |
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| title fr |
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| title nl | In situ studie van de oppervlaktechemie tijdens de nucleatie en de groei van cobalt en nikkel met atoomlaagdepositie
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| title en | An in situ investigation of the surface chemistry during the nucleation and growth of cobalt and nickel using atomic layer deposition
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| Description fr |
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| Description nl | Dit voorstel beoogt een grondig inzicht te verschaffen in de oppervlaktechemie en fysica tijdens atomaire laagdepositie (ALD) van kobalt en nikkel voor toepassingen in micro-elektronica en katalyse. In micro-elektronica, ALD van hoge kwaliteit, continu
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| Description en | This proposal aims to provide a thorough understanding of the surface chemistry and physics during atomic layer deposition (ALD) of cobalt and nickel for applications in microelectronics and catalysis. In microelectronics, ALD of high quality, continuous
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| Qualifiers | - AFM - ALD - Cobalt - FTIR - GISAXS - Kobalt - Nickel - Nikkel - STM - XPS - XRF - area selective - bimetaal - bimetallic - catalysis - diazadienyl - gebiedsselectief - in situ - in vacuo - katalyse - micro-elektronica - microelectronics - plasma - |
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| Personal | Dendooven Jolien, Detavernier Christophe |
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